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                仪器/ 产品中心/ 实验室常用设备/ 制样/消解设备/ 气相沉积系统/ 脉冲激光沉积系统 Pioneer 180 PLD System
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                脉冲激光沉积系统 Pioneer 180 PLD System

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                详细介绍

                Special Features

                • Stand-alone turn-key PLD System.

                • Deposition of epitaxial films, multilayer heterostructures and Superlattices.

                • Deposition of nanoscale thin films using insitu RHEED diagnostics.

                • Oxygen compatibility for oxide film depositions.

                • Upgrades: Ion-assisted PLD, Combinatorial PLD, Target-Substrate load-locks.

                • Additional deposition sources: Pulsed Electron Deposition (PED), RF/DC Sputtering, DC ion guns.

                • Integration with XPS /ARPES UHV Cluster tools, insitu UHV wafer transfer.

                • Insitu diagnostics: Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES).

                Overview

                Pioneer 180 PLD System is a turn-key PLD system for preparing high quality epitaxial films, multi-layer heterostructures and superlattices of a variety of materials on a variety of substrates. The primary difference between this PLD system and the Pioneer 120 Advanced PLD System is that the PLD System features a larger deposition module facilitating a number of upgrades that may be limited in Pioneer 120 Advanced PLD System. Pioneer 180 integrates an Oxygen compatible radiative heating stage. The heater is Oxygen compatible up to 1 atmosphere (760 Torr) of Oxygen, a unique feature valuable for preparing epitaxial oxide films that require (i) deposition in Oxygen, (ii) post deposition annealing in Oxygen and also cool-down in Oxygen pressures approaching 1 atmosphere. The substrates rotate continuously and can be load-locked.

                Pioneer 180 PLD System includes an automated multi-target carousel with target rotation, target raster and software controlled target selection as needed for multilayer and superlattice depositions. A closed loop pressure control provides precise process pressure control using mass flow controllers. The dry pumping package is a combined turbomolecular pump backed by a mechanical diaphragm or scroll pump. The System software (Windows 7, LabView 2013) controls the substrate heater, target carousel, process pressure, System pumps and laser triggering. Since the substrate can be transferred, a variety of options become feasible. These include but not limited to integrating the PLD system with a variety of other deposition platforms such as UHV Sputter Systems and also with UHV analytical systems such as XPS/ARPES etc.


                Feature & Details

                Multi-target Carousel 

                ? Six 1-inch diameter targets or three 2-inch diameter targets. 

                ? Target rotation, 360 degrees continuous (1-20 RPM). 

                ? Target rastering (max 100 degrees/sec) for uniform ablation over the entire target surface.

                Vacuum Pumping Package 

                ? All-dry vacuum pumps: Turbomolecular pump backed by dry mechanical pump. 

                ? Minimum base pressure: 8 x 10-8 Torr in standard systems, 5 x 10-9 Torr in UHV systems. ? Turbo-speed is controlled by software.

                Pressure Measurement and Control

                ? Wide range vacuum gauges for pressure measurement from atmosphere to 5 x 10-9 Torr

                PLD System Software 

                ? Windows 7, LabVIEW 2013 ? Controls substrate heating stage. 

                ? Controls target carousel stage

                PLD System Utilities

                ? Power: 110/220V, 20A, 1 Phase. 

                ? Water: 1 gallon/minute at 20C.

                PLD Optics Package (KrF Excimer Laser) 

                ? 45°and 22.5° degree Laser Mirrors for 248nm. 

                ? Plano-convex Lens for 248nm. The focal length is approximately 50 cm.



                产品优势
                Stand-alone turn-key PLD System.

                Deposition of epitaxial films, multilayer heterostructures and Superlattices.

                Deposition of nanoscale thin films using insitu RHEED diagnostics.

                Oxygen compatibility for oxide film depositions.

                Upgrades: Ion-assisted PLD, Combinatorial PLD, Target-Substrate load-locks.

                Additional deposition sources: Pulsed Electron Deposition (PED), RF/DC Sputtering, DC ion guns.

                Integration with XPS /ARPES UHV Cluster tools, insitu UHV wafer transfer.

                Insitu diagnostics: Low Angle X-ray Spectroscopy (LAXS) and Ion Energy Spectroscopy (IES).
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