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                江苏快三/ 产品中心/ 光学仪器/ 其它/ 其它光学仪器/ Nanoscribe超高速双光子灰度光刻技术微纳3D打印设备
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                Nanoscribe超高速双光子灰度光刻技术微纳3D打印设备

                • 品牌:纳糯
                • 型号: Quantum X
                • 产地:德国
                • 供应商报价: 面议
                • Quantum X新型超高速无掩模光刻技术的核心是Nanoscribe独家专利的双光子灰度光刻技术(2GL?)。该技术☆将灰度光刻的卓越性能与双光★子聚合的精确性和灵活性完美结合,使其同时具♂备高速打印,完全设计自由度和超高精度的特点。从而满足了高端复杂增材制造对于优异形状精度和光滑表面的极高要求。这种具...[查看全部]
                • 标签: 双光子聚合,无掩模光刻技术,微纳光学,3D微纳打印
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                纳糯三维科技(上海)有限公司

                主营产品:微纳3D打印机,其它光学仪器

                详细介绍

                Quantum X,world's first Two-Photon Grayscale Lithography system for maskless microfabrication of refractive and diffractive microoptics.

                The brand-new Quantum X system from Nanoscribe is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements.

                The world’s first Two-Photon Grayscale Lithography (2GL ?) system combines the extraordinary performance of grayscale lithography with the precision and flexibility of Nanoscribe’s pioneering Two-Photon-Polymerization technology.

                The new microfabrication system offers high speed, full design freedom and the precision needed for additive fabrication of complex structures requiring high shape accuracy and ultra-smooth surfaces. Fast and accurate additive manufacturing processes drastically shorten design iteration cycles and enable cost-effective microfabrication.

                This breakthrough technology combines additive microfabrication with ultra-fast voxel size tuning: Two-Photon Grayscale Lithography (2GL) paves the way for ultra-fast, accurate and free-form microfabrication without compromising speed or accuracy.

                Quantum X controls the voxel size along one scanning plane using synchronized laser power modulation at high speeds. In this manner, complex shapes are produced and variable feature heights are achievable within one scan field. Discrete and accurate steps as well as essentially continuous topographies can be printed on up to six-inch wafer substrates without the need for additional lithography steps or mask fabrication.

                The Quantum X wizard guides you through the print job creation. The integrated software accepts grayscale images of up to 32-bit resolution for direct fabrication with 2GL. Diffractive and refractive microoptics in 2D and 2.5D materialize with smooth surfaces and high shape accuracy.

                       


                产品优势

                Quantum X新型超高速无掩模光刻技术的核心是Nanoscribe独家专利的双光子灰度光刻技术(2GL?)。该技术将灰度光刻的卓越性能与双光子聚合的精确性和灵活性完美结合,使其№同时具备高速打印,完全设计自由度和超高精度的特点。从而满足了高端复杂增材制造对于优异形状精度和光滑表面的极高要求。这种具有创新性的增材制造工艺大大缩短了企业的设计迭代,打印样品结构既可以用作技术验证原型,也可以用作工业生产上的加工模具。

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