Quantum X，world's first Two-Photon Grayscale Lithography system for maskless microfabrication of refractive and diffractive microoptics.
The brand-new Quantum X system from Nanoscribe is designed for the microfabrication of prototypes and masters in industrial production processes. This maskless lithography system redefines the fabrication of free-form microoptics, microlens arrays and multi-level diffractive optical elements.
The world’s first Two-Photon Grayscale Lithography (2GL ?) system combines the extraordinary performance of grayscale lithography with the precision and flexibility of Nanoscribe’s pioneering Two-Photon-Polymerization technology.
The new microfabrication system offers high speed, full design freedom and the precision needed for additive fabrication of complex structures requiring high shape accuracy and ultra-smooth surfaces. Fast and accurate additive manufacturing processes drastically shorten design iteration cycles and enable cost-effective microfabrication.
This breakthrough technology combines additive microfabrication with ultra-fast voxel size tuning: Two-Photon Grayscale Lithography (2GL) paves the way for ultra-fast, accurate and free-form microfabrication without compromising speed or accuracy.
Quantum X controls the voxel size along one scanning plane using synchronized laser power modulation at high speeds. In this manner, complex shapes are produced and variable feature heights are achievable within one scan field. Discrete and accurate steps as well as essentially continuous topographies can be printed on up to six-inch wafer substrates without the need for additional lithography steps or mask fabrication.
The Quantum X wizard guides you through the print job creation. The integrated software accepts grayscale images of up to 32-bit resolution for direct fabrication with 2GL. Diffractive and refractive microoptics in 2D and 2.5D materialize with smooth surfaces and high shape accuracy.
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